A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing...

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A new process has been developed for applying photoresist to125-mm silicon wafers used in manufacturing integrated circuits.Ten wafers were tested, and the following photoresist thicknessmeasurements (in angstroms x1000) were observed:
13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965,13.3925, 13.3946, and 13.4002.
(a) Test the hypothesis that mean thickness is 13.4 x 1000Å. Use =0.05 and assume a two sided
alternative.
(b) Find a 99% two-sided confidence interval on mean photoresistthickness. Assume that thickness
is normally distributed.
(c) Does the normality assumption seem reasonable for thesedata?

Answer & Explanation Solved by verified expert

4.5 Ratings (612 Votes)

Part a Here we have to use one sample t test for the population mean H0 134 versus Ha 134 This is a two tailed test From given data we have Sample mean Xbar 1339618 Sample standard deviation S 0003908623 Sample size n 10 Degrees of freedom n 1 10 1 9 See Answer

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