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You are considering options for a deposition process for a-Si that gives acceptable quality films and...

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Chemistry

You are considering options for a deposition process for a-Sithat gives acceptable quality films and is able to deposit 5 nmthickness in less than a minute. Compare the HW PECVD, VHF PECVDand RFCVD in terms of the required output.

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4.3 Ratings (882 Votes)
Plasma Enhanced Chemical Vapor Deposition PECVD is a processby which thin films of various materials can be deposited onsubstrates at lower temperature than that of standard    See Answer
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