From the following techniques:
Thermal CVD (Chemical Vapor Deposition),
Metalorganic CVD,
Plasma-enhanced CVD,
Atomic Layer Deposition (ALD),
Plating,
Sol-gel,
Sputtering,
Thermal evaporation,
Electron beam evaporation,
Molecular Beam Epitaxy (MBE),
Laser ablation,
Ion plating,
choose one that is best suited for depositing
a) 100 nm Al coating on a rolled polymer foilhaving width of 1 m and length of hundreds of meters,
b) High purity 10 nm Au coating on aSi3N4 on Si substrate to be used as acontact,
c) Insulating 50 nm thick layer of oxide on ahighly porous piece of material, which needs to be coatedthroughout,
d) 20 µm of zinc on a frame of a car.
Motivate your selections and discuss qualitatively the resultingfilm quality, productivity, cost, possible hazards andenvironmental issues.
