From the following techniques: Thermal CVD (Chemical Vapor Deposition), Metalorganic CVD, Plasma-enhanced CVD, Atomic Layer Deposition (ALD), Plating, Sol-gel, Sputtering, Thermal evaporation, Electron beam...

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Physics

From the following techniques:
Thermal CVD (Chemical Vapor Deposition),
Metalorganic CVD,
Plasma-enhanced CVD,
Atomic Layer Deposition (ALD),
Plating,
Sol-gel,
Sputtering,
Thermal evaporation,
Electron beam evaporation,
Molecular Beam Epitaxy (MBE),
Laser ablation,
Ion plating,
choose one that is best suited for depositing
a) 100 nm Al coating on a rolled polymer foilhaving width of 1 m and length of hundreds of meters,
b) High purity 10 nm Au coating on aSi₃N₄ on Si substrate to be used as acontact,
c) Insulating 50 nm thick layer of oxide on ahighly porous piece of material, which needs to be coatedthroughout,
d) 20 Âµm of zinc on a frame of a car.
Motivate your selections and discuss qualitatively the resultingfilm quality, productivity, cost, possible hazards andenvironmental issues.

Answer & Explanation Solved by verified expert

3.8 Ratings (553 Votes)

a It can be done using PVD techniques and since its hundreds of meters long sputtering is not favourable and also ebeam evaporation The flim quality wont be that good if Thermal Evaporation is used but since its polymer and in Thermal evaporation the polymer wont be heated to high temperature and so the danger of damage of See Answer

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