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A scientist would like to use thermal diffusion to dope the silicon wafer. He decides to...

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Chemistry

A scientist would like to use thermal diffusion to dope thesilicon wafer. He decides to deposit 10 nm Boron on the surface andheat up the wafer to allow Boron to diffuse into the wafer. Whattechnique do you recommend him to use to deposit high purity Boronon the surface? Explain what are the machines he could use and whatkind of precursors he needs to use.

Answer & Explanation Solved by verified expert
4.4 Ratings (705 Votes)
Types of diffusion 1Empty space diffusion Even in perfect single crystals there will be empty places which the dopnt can fill B 2 Inter lattice diffusion The impurity atoms move into the void spaces between silicon atoms in the crystal lattice 3 Exchange with silcon atoms The dopant atoms which occupy lattice positions can exhange with Si atoms The rate of diffusion depends mainly on the following factors 1 Nature and quantity of the substrate Si 2    See Answer
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