4. Explain why the potential of a glow discharge (plasma region) used in dry etching is...

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Electrical Engineering

4. Explain why the potential of a glow discharge (plasma region)used in dry etching is positive, relative to ground.

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Vdc is an extremely important parameter for understanding the dry etching mechanism In the parallelplate dry etching equipment reactiveion etching RIE a lower electrode on which a wafer is placed is connected to an RF power supply through a blocking capacitor and the opposite electrode upper    See Answer
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