3. The nitridation of a silicon particle can be described by a simple binary diffusion of...

80.2K

Verified Solution

Question

Chemistry

3. The nitridation of a silicon particle can be described by asimple binary diffusion of oxygen through the nitride film and afast reaction at the silicon/nitride interface, i.e., adiffusion-controlled process; 2N2+3Siâ€”>Si3N4. A typical model,based on a quasi-steady state assumption, leads to the siliconradius Rf being a function of time (t); initial particle size isR0. For a small silicon particle, the film thickness of not tosmall as compared with the particle size. In such a case, thenitrogen concentration profile may not be linear. With this, pleasederive a model to simulate the consumption of silicon particle (Rf(t)). The solubility of oxygen in the film is CO and the molardensity of the film is Cf .

Answer & Explanation Solved by verified expert

4.3 Ratings (734 Votes)

This question is related to silicon chemistry The nitridation of a silicon particle is described by a simple binary diffusion of oxygen through the nitride film and a fast reaction at the siliconnitride interface that is a diffusioncontrolled process which is given by the following reaction 2N23Si Si3N4 A typical model based on a quasisteady See Answer

Get Answers to Unlimited Questions

Join us to gain access to millions of questions and expert answers. Enjoy exclusive benefits tailored just for you!

Membership Benefits:

Unlimited Question Access with detailed Answers
Zin AI - 3 Million Words
10 Dall-E 3 Images
20 Plot Generations
Conversation with Dialogue Memory
No Ads, Ever!
Access to Our Best AI Platform: Flex AI - Your personal assistant for all your inquiries!

Become a Member