1. (20) Literature survey. Write a mini report on promising photolithography technologies for nm critical features in...

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Electrical Engineering

1. (20) Literature survey.

Write a mini report on promising photolithography technologiesfor nm critical features in future generations of semiconductortechnology.

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Abstract Continuous rapid shrinking of feature size made the authoritiesto seek alternative patterning methods as the conventionalphotolithography comes with its intrinsic resolution limit In thisregard some promising techniques have been proposed asnextgeneration lithography NGL that has the potentials toachieve both highvolume production and very high resolution Thisarticle reviews the promising NGL techniques and introduces thechallenges and a perspective on future directions of the NGLtechniques Extreme ultraviolet lithography EUVL is considered asthe main candidate for sub10nm manufacturing and it couldpotentially meet the current requirements of the industryRemarkable progress in EUVL has been made and the tools will beavailable for commercial operation soon Maskless lithographytechniques are used for patterning in RD maskmoldfabrication and lowvolume chip design Directed selfassembly hasalready been realized in laboratory and further effort will beneeded to make it as NGL solution Nanoimprint lithography hasemerged attractively due to its simple process steps highthroughput high resolution and low cost and become one of thecommercial platforms for nano fabrication However a number ofchallenging issues are waiting ahead and further technologicalprogresses are required to make the techniques significant andreliable to meet the current demand Finally a comparative studyis presented among these techniquesIntroduction    See Answer
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